广东工业大学教师主页平台管理系统潘继生--中文主页-- (2) Jisheng Pan, Zhijun Chen and Qiusheng Yan. Study on the rheological properties and polishing properties of SiO2@CI composite particle for sapphire wafer. Smart Materials and Structures[J], 2020，29(11). 114003 SCI二区

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个人信息

潘继生Jisheng PAN

硕士生导师

所在单位：机电工程学院

在职信息：在职

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(2) Jisheng Pan, Zhijun Chen and Qiusheng Yan. Study on the rheological properties and polishing properties of SiO2@CI composite particle for sapphire wafer. Smart Materials and Structures[J], 2020，29(11). 114003 SCI二区

发布时间：2021-03-05 点击次数：

是否译文：否

上一条：(1) Qixiang Zhang, Jisheng Pan *, Xiaowei Zhang, Jiabin Lu, Qiusheng Yan. Tribological behavior of 6H–SiC wafers in different chemical mechanical polishing slurries. Wear[J]. 2021, 472-473(15) , 203649 SCI一区下一条：(3) Pan J, Zheng K, Yan Q, Zhang Q, Lu J. Optimization study on magnetorheological fluid components and process parameters of cluster magnetorheological finishing with dynamic magnetic field for sapphire substrates[J]. Smart Materials and Structures, 2020 (11).