广东工业大学教师主页平台管理系统 shenyijiang--Home-- 10. Y. Shen*, N. Wong, and E. Y. Lam, “Level-set-based inverse lithography for photomask synthesis,” Opt. Express 17(26): 23690

沈逸江

本人自从2005年以来一直从事光刻系统成像和光学临近效应校正，图像合成，图像恢复技术，以及偏微分方程的数值计算等方面的研究工作。在此期间对光刻系统的矢量成像模型、反演光刻优化算法、二值图像的半正定恢复和偏微分方程的有限差分算法等多方面技术有比较深入的研究。在光刻成像系统、分辨率增强技术(RET)、光学临近校正(OPC)算法和机器学习等领域均有良好的研究背景，取得了一定的研究成果。代表性工作如下：· 建立...Detials

Paper Publications Current position: Home > Scientific Research > Paper Publications

10. Y. Shen*, N. Wong, and E. Y. Lam, “Level-set-based inverse lithography for photomask synthesis,” Opt. Express 17(26): 23690–23701, 2009. (JCR一区，TOP期刊)

Release time:2021-03-18 Hits:

Translation or Not:no

Pre One: X. J. Wei, X. P. Wang, X. T, Q. Y. An*, L. Q. Mai*. Nanostructured Conversion-Type Negative Electrode Materials for Low-Cost and High-Performance Sodium-Ion Batteries. Advanced Functional Materials, 2018, 28, 1804458. Next One:X. J. Wei, X. P. Wang, Q. Y. An, C. H. Han* and L. Q. Mai*. Operando X-ray Diffraction Characterization for Understanding the Intrinsic Electrochemical Mechanism in Rechargeable Battery Materials. Small Methods, 2017, 1, 1700083