Jisheng PAN

Doctor of Engineering

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(2) Jisheng Pan; Qiusheng Yan and Weihua Li. Double-face polishing device and method capable of controlling rigidity of polishing pad through cluster dynamic magnetic field[P]. US15555073. 2018.08.31

Release time:2021-03-07 Hits:

Service Invention or Not:no

Pre One:(1) Jisheng Pan; Qiusheng Yan; Weiqiang Gao and Peng Yu. Self-sharpening polishing device with magnetorheological flexible polishing pad formed by dynamic magnetic field and polishing method thereof[P]. US10118269B2. 2018.11.6 Next One:(3) Jisheng Pan, Qiusheng Yan, Weihua Li. double-sided polishing device and method having polishing pad with stiffness controlled by dynamic cluster magnetic field[P]. PCT/CN2017/070456, 2017.12.14

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